Paper Title:
Donor Doping of ZnSe: Lattice Location and Annealing Behavior of Implanted Boron
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 258-263)
Edited by
Gordon Davies and Maria Helena Nazaré
Pages
1389-1394
DOI
10.4028/www.scientific.net/MSF.258-263.1389
Citation
B. Ittermann, G. Welker, F. Kroll, F. Mai, K. Marbach, H. Ackermann, H.J. Stöckmann, E. Oldekop, W.-D. Zeitz, "Donor Doping of ZnSe: Lattice Location and Annealing Behavior of Implanted Boron", Materials Science Forum, Vols. 258-263, pp. 1389-1394, 1997
Online since
December 1997
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Price
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