Paper Title:
Formation Kinetics of the Al-Related Shallow Thermal Donors: A Probe for Oxygen Diffusion in Silicon
  Abstract

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Periodical
Materials Science Forum (Volumes 258-263)
Edited by
Gordon Davies and Maria Helena Nazaré
Pages
1761-1766
DOI
10.4028/www.scientific.net/MSF.258-263.1761
Citation
P. Kaczor, L. Dobaczewski, T. Gregorkiewicz, C.A.J. Ammerlaan, "Formation Kinetics of the Al-Related Shallow Thermal Donors: A Probe for Oxygen Diffusion in Silicon", Materials Science Forum, Vols. 258-263, pp. 1761-1766, 1997
Online since
December 1997
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