Paper Title:
Low Temperature Hydrogen Diffusion in Silicon: Influence of Substrate Quality and the Surface Damage
  Abstract

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Periodical
Materials Science Forum (Volumes 258-263)
Edited by
Gordon Davies and Maria Helena Nazaré
Pages
191-196
DOI
10.4028/www.scientific.net/MSF.258-263.191
Citation
M.I. Symko, B. L. Sopori, R. Reedy, K. M. Jones, "Low Temperature Hydrogen Diffusion in Silicon: Influence of Substrate Quality and the Surface Damage", Materials Science Forum, Vols. 258-263, pp. 191-196, 1997
Online since
December 1997
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Price
$32.00
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