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The Hydrogen-Saturated Self-Interstitial in Silicon and Germanium

Journal Materials Science Forum (Volumes 258 - 263)
Volume Defects in Semiconductors 19
Edited by Gordon Davies and Maria Helena Nazaré
Pages 35-40
DOI 10.4028/www.scientific.net/MSF.258-263.35
Citation M. Budde et al., 1997, Materials Science Forum, 258-263, 35
Authors M. Budde, B. Bech Nielsen, P. Leary, Jonathan P. Goss, R. Jones, Patrick R. Briddon, Sven Öberg, S.J. Breuer
Keywords Ab Initio Theory, Ge, H, IR Spectroscopy, Self-Interstitial, Silicon, Uniaxial Stress
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