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Nitrogen Doping Efficiency During Vapor Phase Epitaxy of 4H-SiC

Journal Materials Science Forum (Volumes 264 - 268)
Volume Silicon Carbide, III-Nitrides and Related Materials
Edited by G. Pensl, H. Morkoç, B. Monemar and E. Janzén
Pages 115-118
DOI 10.4028/www.scientific.net/MSF.264-268.115
Citation L.B. Rowland et al., 1998, Materials Science Forum, 264-268, 115
Online since February, 1998
Authors L.B. Rowland, Albert A. Burk, C.D. Brandt
Keywords Doping, Epitaxial Growth, Nitrogen, Vapor-Phase Epitaxy (VPE)
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