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Growth of 4H and 6H SiC Trenches and Around Stripe Mesas

Journal Materials Science Forum (Volumes 264 - 268)
Volume Silicon Carbide, III-Nitrides and Related Materials
Edited by G. Pensl, H. Morkoç, B. Monemar and E. Janzén
Pages 131-134
DOI 10.4028/www.scientific.net/MSF.264-268.131
Citation Nils Nordell et al., 1998, Materials Science Forum, 264-268, 131
Online since February, 1998
Authors Nils Nordell, S. Karlsson, Andrey O. Konstantinov
Keywords Epitaxy, Growth Habit, Mesa, Non-Planar Substrate, Trench
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