Paper Title:
Effect of Substrate Bias on 3C-SiC Deposition on Si by AC Plasma-Assisted CVD
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 264-268)
Edited by
G. Pensl, H. Morkoç, B. Monemar and E. Janzén
Pages
211-214
DOI
10.4028/www.scientific.net/MSF.264-268.211
Citation
H. Shimizu, M. Shiga, "Effect of Substrate Bias on 3C-SiC Deposition on Si by AC Plasma-Assisted CVD", Materials Science Forum, Vols. 264-268, pp. 211-214, 1998
Online since
February 1998
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Price
$32.00
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