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Fabrication of 3C-SiC on SiO2 Structures Using Wafer Bonding Techniques

Journal Materials Science Forum (Volumes 264 - 268)
Volume Silicon Carbide, III-Nitrides and Related Materials
Edited by G. Pensl, H. Morkoç, B. Monemar and E. Janzén
Pages 223-226
DOI 10.4028/www.scientific.net/MSF.264-268.223
Citation Christian A. Zorman et al., 1998, Materials Science Forum, 264-268, 223
Online since February, 1998
Authors Christian A. Zorman, K.N. Vinod, A.A. Yasseen, Mehran Mehregany
Keywords APCVD, Defect Density, Mechanical Polishing, Poly-Silicon, SiO2, Wafer Bonding
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