Paper Title:
High Temperature X-Ray Diffraction Studies of the Phase Formation Process of Iridium Silicide Thin Films
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 278-281)
Edited by
R. Delhez and E.J. Mittemeijer
Pages
448-453
DOI
10.4028/www.scientific.net/MSF.278-281.448
Citation
R. Kurt, W. Pitschke, A. Heinrich, K. Wetzig, "High Temperature X-Ray Diffraction Studies of the Phase Formation Process of Iridium Silicide Thin Films", Materials Science Forum, Vols. 278-281, pp. 448-453, 1998
Online since
April 1998
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Price
$32.00
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