Paper Title:
Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 282-283)
Edited by
Dragan P. Uskokovic, Slobodan K. Milonjic, Dejan I. Rakovic
Pages
123-130
DOI
10.4028/www.scientific.net/MSF.282-283.123
Citation
P. Zanella, G.A. Battiston, G. Carta, R. Gerbasi, M. Porchia, G. Rossetto, "Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials", Materials Science Forum, Vols. 282-283, pp. 123-130, 1998
Online since
May 1998
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.