Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials |
| Journal |
Materials Science Forum (Volumes 282 - 283) |
| Volume |
Advanced Materials and Processes |
| Edited by |
Dragan P. Uskokovic, Slobodan K. Milonjic, Dejan I. Rakovic |
| Pages |
123-130 |
| DOI |
10.4028/www.scientific.net/MSF.282-283.123 |
| Citation |
P. Zanella et al., 1998, Materials Science Forum, 282-283, 123 |
| Authors |
P. Zanella, G.A. Battiston, G. Carta, R. Gerbasi, M. Porchia, G. Rossetto |
| Keywords |
MOCVD, Precursor, Synthesis, Thin Film |
| Full Paper |
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