Nonequilibrium Plasmas for Material Processing in Microelectronics |
| Journal |
Materials Science Forum (Volumes 282 - 283) |
| Volume |
Advanced Materials and Processes |
| Edited by |
Dragan P. Uskokovic, Slobodan K. Milonjic, Dejan I. Rakovic |
| Pages |
47-56 |
| DOI |
10.4028/www.scientific.net/MSF.282-283.47 |
| Citation |
Z.Lj. Petrović et al., 1998, Materials Science Forum, 282-283, 47 |
| Authors |
Z.Lj. Petrović, T. Makabe |
| Keywords |
Capacitively Coupled Plasma, Inductively Coupled Plasma, Ionization, Ionization Energies, Plasma Chemistry, Plasma Deposition, Plasma Etching, Rf Discharges, Thin Film |
| Full Paper |
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