Recent Results on Reactive Magnetron Sputtering for High-Rate Deposition of Ceramic Compound Films |
| Journal |
Materials Science Forum (Volumes 287 - 288) |
| Volume |
Trends and New Applications of Thin Films |
| Edited by |
Horst Hoffmann |
| Pages |
107-118 |
| DOI |
10.4028/www.scientific.net/MSF.287-288.107 |
| Citation |
A. Billard et al., 1998, Materials Science Forum, 287-288, 107 |
| Authors |
A. Billard, C. Frantz |
| Keywords |
Arcing, Ceramic Compound Films, Control Techniques, High Rate Deposition, Modulated Discharge, Pulsed Discharge, Reactive Magnetron Sputtering, Sputtering Instability |
| Full Paper |
Get the full paper by clicking here
|
