Spectroellipsometric Method for Process Monitoring of Semiconductor Thin Films and Interfaces |
| Journal |
Materials Science Forum (Volumes 287 - 288) |
| Volume |
Trends and New Applications of Thin Films |
| Edited by |
Horst Hoffmann |
| Pages |
151-158 |
| DOI |
10.4028/www.scientific.net/MSF.287-288.151 |
| Citation |
R. Brenot et al., 1998, Materials Science Forum, 287-288, 151 |
| Authors |
R. Brenot, Morten Kildemo, B. Drévillon |
| Keywords |
Approximation of Reflection Coefficient, Gradient-Index, PECVD, Real-Time Control, Real-Time Monitoring, μc-Si |
| Full Paper |
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