Paper Title:
Spectroellipsometric Method for Process Monitoring of Semiconductor Thin Films and Interfaces
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 287-288)
Edited by
Horst Hoffmann
Pages
151-158
DOI
10.4028/www.scientific.net/MSF.287-288.151
Citation
R. Brenot, M. Kildemo, B. Drévillon, "Spectroellipsometric Method for Process Monitoring of Semiconductor Thin Films and Interfaces", Materials Science Forum, Vols. 287-288, pp. 151-158, 1998
Online since
August 1998
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Price
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