Paper Title:
An UHV-Compatible DC Off-Axis Sputtering Device for Reactive Sputtering and Investigation of the Plasma Properties during Niobium Deposition
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 287-288)
Edited by
Horst Hoffmann
Pages
319-322
DOI
10.4028/www.scientific.net/MSF.287-288.319
Citation
A. Krämer, H. Hammer, A. Schneider, "An UHV-Compatible DC Off-Axis Sputtering Device for Reactive Sputtering and Investigation of the Plasma Properties during Niobium Deposition", Materials Science Forum, Vols. 287-288, pp. 319-322, 1998
Online since
August 1998
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Price
$32.00
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