Paper Title:
Correlation between Deposition Rate and Hardness of Remote PECVD Silicon Oxide Films
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 287-288)
Edited by
Horst Hoffmann
Pages
389-392
DOI
10.4028/www.scientific.net/MSF.287-288.389
Citation
C. Bayer, P. R. von Rohr, "Correlation between Deposition Rate and Hardness of Remote PECVD Silicon Oxide Films", Materials Science Forum, Vols. 287-288, pp. 389-392, 1998
Online since
August 1998
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.