Paper Title:
Influence of Deposition Parameters on the Properties of Titanium Nitride Films Formed by Ion Beam Assisted Evaporation
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 287-288)
Edited by
Horst Hoffmann
Pages
499-502
DOI
10.4028/www.scientific.net/MSF.287-288.499
Citation
D. Wolff, H. Oechsner, "Influence of Deposition Parameters on the Properties of Titanium Nitride Films Formed by Ion Beam Assisted Evaporation", Materials Science Forum, Vols. 287-288, pp. 499-502, 1998
Online since
August 1998
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