Paper Title:
AlN Epitaxial Films Grown by ECR Plasma Assisted Metalorganic Chemical Vapor Deposition under Controlled Plasma Condition in Afterglow Region
  Abstract

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Periodical
Materials Science Forum (Volumes 338-342)
Edited by
Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer
Pages
1511-1514
DOI
10.4028/www.scientific.net/MSF.338-342.1511
Citation
K. Yasui, S. Hoshino, T. Akahane, "AlN Epitaxial Films Grown by ECR Plasma Assisted Metalorganic Chemical Vapor Deposition under Controlled Plasma Condition in Afterglow Region", Materials Science Forum, Vols. 338-342, pp. 1511-1514, 2000
Online since
May 2000
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Price
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