Paper Title:
3-D Thermal and Flow Modeling of Hot Wall Epitaxial Chemical Vapor Deposition Reactors, Heated by Induction
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 338-342)
Edited by
Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer
Pages
153-156
DOI
10.4028/www.scientific.net/MSF.338-342.153
Citation
P. M. Lofgren, C. Hallin, C.-Y. Gu, W. Ji, "3-D Thermal and Flow Modeling of Hot Wall Epitaxial Chemical Vapor Deposition Reactors, Heated by Induction", Materials Science Forum, Vols. 338-342, pp. 153-156, 2000
Online since
May 2000
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$32.00
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