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High Growth Rate Epitaxy of Thick 4H-SiC Layers

Journal Materials Science Forum (Volumes 338 - 342)
Volume Silicon Carbide and Related Materials - 1999
Edited by Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer
Pages 165-168
DOI 10.4028/www.scientific.net/MSF.338-342.165
Citation Mikael Syväjärvi et al., 2000, Materials Science Forum, 338-342, 165
Authors Mikael Syväjärvi, Rositza Yakimova, Henrik Jacobsson, Margareta K. Linnarsson, Anne Henry, Erik Janzén
Keywords Doping, Epitaxy, Purity, Semi-insulating (SI)
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