Paper Title:
Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si
  Abstract

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Periodical
Materials Science Forum (Volumes 338-342)
Edited by
Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer
Pages
325-328
DOI
10.4028/www.scientific.net/MSF.338-342.325
Citation
Y. H. Wang, J. Y. Lin, Z. C. Feng, S. J. Chua, C. H. H. Alfred, "Plasma Enhanced Chemical Vapor Deposition and Characterization of Hydrogenated Amorphous SiC Films on Si", Materials Science Forum, Vols. 338-342, pp. 325-328, 2000
Online since
May 2000
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Price
$32.00
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