Paper Title:
Thin Films of α-Si1-xCx:H Deposited by PECVD: The r.f. Power and H2 Dilution Role
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 338-342)
Edited by
Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer
Pages
329-334
DOI
10.4028/www.scientific.net/MSF.338-342.329
Citation
R.J. Prado, M.C.A. Fantini, M.H. Tabacniks, I. Pereyra, A.M. Flank, "Thin Films of α-Si1-xCx:H Deposited by PECVD: The r.f. Power and H2 Dilution Role", Materials Science Forum, Vols. 338-342, pp. 329-334, 2000
Online since
May 2000
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