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Growth Rate Control in SiC-Physical Vapor Transport Method Through Heat Transfer Modeling and Non-Stationary Process Conditions

Journal Materials Science Forum (Volumes 338 - 342)
Volume Silicon Carbide and Related Materials - 1999
Edited by Calvin H. Carter, Jr., Robert P. Devaty, and Gregory S. Rohrer
Pages 39-42
DOI 10.4028/www.scientific.net/MSF.338-342.39
Citation Thomas L. Straubinger et al., 2000, Materials Science Forum, 338-342, 39
Authors Thomas L. Straubinger, Matthias Bickermann, M. Grau, Dieter Hofmann, L. Kadinski, Stephan G. Müller, M. Selder, Peter J. Wellmann, Albrecht Winnacker
Keywords Heat Transfer, Mass Transport, Non-Stationary Process
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