Paper Title:
Stress in Poly-SiC Films Grown by Low Pressure CVD
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 347-349)
Edited by
A.J. Böttger, R. Delhez and E.J. Mittemeijer
Pages
477-485
DOI
10.4028/www.scientific.net/MSF.347-349.477
Citation
J. Rodríguez-Viejo, E. Hurtós, R. Kressmann, M. T. Clavaguera-Mora, "Stress in Poly-SiC Films Grown by Low Pressure CVD", Materials Science Forum, Vols. 347-349, pp. 477-485, 2000
Online since
May 2000
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Price
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