Paper Title:
Origin of the Excellent Thermal Stability of Al/Si-Based Ohmic Contacts to p-Type LPE 4H-SiC
  Abstract

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Periodical
Materials Science Forum (Volumes 353-356)
Edited by
G. Pensl, D. Stephani and M. Hundhausen
Pages
251-254
DOI
10.4028/www.scientific.net/MSF.353-356.251
Citation
L. Kassamakova, R. Kakanakov, I. Kassamakov, K. Zekentes, K. Tsagaraki, G. Atanasova, "Origin of the Excellent Thermal Stability of Al/Si-Based Ohmic Contacts to p-Type LPE 4H-SiC", Materials Science Forum, Vols. 353-356, pp. 251-254, 2001
Online since
January 2001
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