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Growth of Highly Aluminum-Doped p-type 6H-SiC Single Crystals by the Modified Lely Method

Journal Materials Science Forum (Volumes 353 - 356)
Volume Silicon Carbide and Related Materials 2000
Edited by G. Pensl, D. Stephani and M. Hundhausen
Pages 45-48
DOI 10.4028/www.scientific.net/MSF.353-356.45
Citation Norbert Schulze et al., 2001, Materials Science Forum, 353-356, 45
Authors Norbert Schulze, Jürgen Gajowski, Kurt Semmelroth, Michael Laube, Gerhard Pensl
Keywords Acceptor, Aluminium, C-V, Hall Scattering Factor, Hall-Effect, p-Type, SIMS, Sublimation Growth
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