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Study of Boron Incorporation During PVT Growth of p-type SiC Crystals

Journal Materials Science Forum (Volumes 353 - 356)
Volume Silicon Carbide and Related Materials 2000
Edited by G. Pensl, D. Stephani and M. Hundhausen
Pages 49-52
DOI 10.4028/www.scientific.net/MSF.353-356.49
Citation Matthias Bickermann et al., 2001, Materials Science Forum, 353-356, 49
Authors Matthias Bickermann, Dieter Hofmann, Michael Rasp, Thomas L. Straubinger, Roland Weingärtner, Peter J. Wellmann, Albrecht Winnacker
Keywords Aluminum Doping, Boron Doping, Bulk Growth, Dopant Homogeneity
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