Paper Title:
Parallel Stress and Perpendicular Strain Depth-Distributions in [001] Silicon Amorphized by Ion Implantation
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 38-41)
Edited by
G. Ferenczi
Pages
243-248
DOI
10.4028/www.scientific.net/MSF.38-41.243
Citation
F. Cembali, R. Fabbri, P. Negrini, M. Servidori, A. Zani, "Parallel Stress and Perpendicular Strain Depth-Distributions in [001] Silicon Amorphized by Ion Implantation", Materials Science Forum, Vols. 38-41, pp. 243-248, 1989
Online since
January 1991
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