Paper Title:
New Thermal Donors and Processes Associated with Oxygen Clustering in Cz-Si at 600° C
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 38-41)
Edited by
G. Ferenczi
Pages
667-672
DOI
10.4028/www.scientific.net/MSF.38-41.667
Citation
K. Schmalz, K. Tittelbach, V. V. Emtsev, Y.N. Daluda, "New Thermal Donors and Processes Associated with Oxygen Clustering in Cz-Si at 600° C", Materials Science Forum, Vols. 38-41, pp. 667-672, 1989
Online since
January 1991
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