Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films |
| Journal |
Materials Science Forum (Volume 382) |
| Volume |
Plasma Processing and Dusty Particles |
| Edited by |
R. Martins, I. Ferreira, E. Fortunato and G. Kroesen |
| Pages |
11-20 |
| DOI |
10.4028/www.scientific.net/MSF.382.11 |
| Authors |
Hugo Águas,
Rodrigo Martins,
Yuri Nunes,
Manuel J.P. Maneira,
Elvira Fortunato
|
| Keywords |
Ion Bombardment, Langmuir Probe, Materials, Plasma Process Regimes |
| Full Paper |
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