Paper Title:
Characteristics of Mobile Ions in the SiO2 Films of SiC-MOS Structures
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 389-393)
Edited by
S. Yoshida, S. Nishino, H. Harima and T. Kimoto
Pages
1017-1020
DOI
10.4028/www.scientific.net/MSF.389-393.1017
Citation
S. J. Jang, H.J. Song, K.Y. Oh, K.H. Lee, Y.J. Lim, N. I. Cho, "Characteristics of Mobile Ions in the SiO2 Films of SiC-MOS Structures", Materials Science Forum, Vols. 389-393, pp. 1017-1020, 2002
Online since
April 2002
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