Paper Title:
Characterization of the Interfaces between SiC and Oxide Films by Spectroscopic Ellipsometry
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 389-393)
Edited by
S. Yoshida, S. Nishino, H. Harima and T. Kimoto
Pages
1029-1032
DOI
10.4028/www.scientific.net/MSF.389-393.1029
Citation
Y. Tomioka, T. Iida, M. Midorikawa, H. Tukada, K. Yoshimoto, Y. Hijikata, H. Yaguchi, M. Yoshikawa, Y. Ishida, R. Kosugi, S. Yoshida, "Characterization of the Interfaces between SiC and Oxide Films by Spectroscopic Ellipsometry", Materials Science Forum, Vols. 389-393, pp. 1029-1032, 2002
Online since
April 2002
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Price
$32.00
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