Paper Title:
X-Ray Photoelectron Spectroscopy Studies of Post-Oxidation Process Effects on Oxide/SiC Interfaces
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 389-393)
Edited by
S. Yoshida, S. Nishino, H. Harima and T. Kimoto
Pages
1033-1036
DOI
10.4028/www.scientific.net/MSF.389-393.1033
Citation
Y. Hijikata, H. Yaguchi, M. Yoshikawa, S. Yoshida, "X-Ray Photoelectron Spectroscopy Studies of Post-Oxidation Process Effects on Oxide/SiC Interfaces", Materials Science Forum, Vols. 389-393, pp. 1033-1036, 2002
Online since
April 2002
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Price
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