Growth of AlN Films by Hot-Wall CVD and Sublimation Techniques: Effect of Growth Cell Pressure |
| Journal |
Materials Science Forum (Volumes 389 - 393) |
| Volume |
Silicon Carbide and Related Materials 2001 |
| Edited by |
S. Yoshida, S. Nishino, H. Harima and T. Kimoto |
| Pages |
1469-1472 |
| DOI |
10.4028/www.scientific.net/MSF.389-393.1469 |
| Citation |
A. Kakanakova-Georgieva et al., 2002, Materials Science Forum, 389-393, 1469 |
| Authors |
A. Kakanakova-Georgieva, Urban Forsberg, Björn Magnusson, Rositza Yakimova, Erik Janzén |
| Keywords |
Aluminium Nitride (AlN), Cathodoluminescence, Energy Dispersive X-Ray Analysis, Hot-Wall CVD, Infrared Reflectance, Optical Microscopy, Sublimation |
| Full Paper |
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