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Silicon Carbide Technology in New Era

Journal Materials Science Forum (Volumes 389 - 393)
Volume Silicon Carbide and Related Materials 2001
Edited by S. Yoshida, S. Nishino, H. Harima and T. Kimoto
Pages 3-8
DOI 10.4028/www.scientific.net/MSF.389-393.3
Citation Hiroyuki Matsunami, 2002, Materials Science Forum, 389-393, 3
Authors Hiroyuki Matsunami
Keywords 4H-SiC MOSFET, Bulk Growth, Channel Mobility, Device Processes, Epitaxial Growth, SiC Technology
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