Paper Title:
Masking Process for High-Energy and High-Temperature Ion Implantation
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 389-393)
Edited by
S. Yoshida, S. Nishino, H. Harima and T. Kimoto
Pages
867-870
DOI
10.4028/www.scientific.net/MSF.389-393.867
Citation
T. Ohyanagi, H. Onose, A. Watanabe, T. Someya, T. Ohno, K. Amemiya, Y. Kobayashi, "Masking Process for High-Energy and High-Temperature Ion Implantation", Materials Science Forum, Vols. 389-393, pp. 867-870, 2002
Online since
April 2002
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Price
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