Paper Title:
Photoelectrochemical Etching Process of 6H-SiC Wafers Using HF-Based Solution and H2O2 Solution as Electrolytes
  Abstract

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Periodical
Materials Science Forum (Volumes 389-393)
Edited by
S. Yoshida, S. Nishino, H. Harima and T. Kimoto
Pages
957-960
DOI
10.4028/www.scientific.net/MSF.389-393.957
Citation
J. G. Song, M. W. Shin, "Photoelectrochemical Etching Process of 6H-SiC Wafers Using HF-Based Solution and H2O2 Solution as Electrolytes", Materials Science Forum, Vols. 389-393, pp. 957-960, 2002
Online since
April 2002
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