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Characterization of Homoepitaxial 4H-SiC Layer Grown from Silane/Propane System

Journal Materials Science Forum (Volumes 433 - 436)
Volume Silicon Carbide and Related Materials - 2002
Edited by Peder Bergman and Erik Janzén
Pages 165-168
DOI 10.4028/www.scientific.net/MSF.433-436.165
Citation C. Sartel et al., 2003, Materials Science Forum, 433-436, 165
Online since September, 2003
Authors C. Sartel, Jean Marie Bluet, Veronique Soulière, I. El Harrouni, Yves Monteil, Michel Mermoux, Gérard Guillot
Keywords C-V Measurement, Growth Rate, Homoepitaxy, LTPL, Raman Spectroscopy, Silane/Propane System
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