Paper Title:
Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films
  Abstract

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Periodical
Materials Science Forum (Volumes 433-436)
Edited by
Peder Bergman and Erik Janzén
Pages
451-454
DOI
10.4028/www.scientific.net/MSF.433-436.451
Citation
H. T. M. Pham, T. Akkaya, C. R. de Boer, P. M. Sarro, "Electrical Characteristics of Plasma-Enhanced Chemical Vapor Deposited Silicon Carbide Thin Films", Materials Science Forum, Vols. 433-436, pp. 451-454, 2003
Online since
September 2003
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