Paper Title:
Performance Stability of Microfocusing Source and Multilayer Optics Based X-Ray Diffraction System
  Abstract

X-ray diffraction systems based on a microfocusing X-ray source and multilayer side-by-side optics are suitable for X-ray diffraction studies in a variety of fields, such as protein crystallography, due to their compactness and low cost in maintenance. However, new problems can occur, such as intensity instability induced by source position drifting. Various investigations for the reasons and the consequences of the instability are presented in this paper. Feasible solutions and suggestions are given to obtain more stable system performance.

  Info
Periodical
Materials Science Forum (Volumes 443-444)
Edited by
Yvonne Andersson, Eric J. Mittemeijer and Udo Welzel
Pages
159-162
DOI
10.4028/www.scientific.net/MSF.443-444.159
Citation
B. Kim, B. Verman, L. Jiang, "Performance Stability of Microfocusing Source and Multilayer Optics Based X-Ray Diffraction System", Materials Science Forum, Vols. 443-444, pp. 159-162, 2004
Online since
January 2004
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Price
$32.00
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