Paper Title:
Comparative Study of Porosity in Low-k SiOCH Thin Films Obtained at Different Deposition Conditions
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Periodical
Materials Science Forum (Volumes 445-446)
Edited by
Toshio Hyodo, Yoshinori Kobayashi, Yasuyuki Nagashima, Haruo Saito
Pages
268-270
DOI
10.4028/www.scientific.net/MSF.445-446.268
Citation
R. S. Brusa, C.E. Macchi, S. Mariazzi, M. Spagolla, G. P. Karwasz, A. Zecca, "Comparative Study of Porosity in Low-k SiOCH Thin Films Obtained at Different Deposition Conditions", Materials Science Forum, Vols. 445-446, pp. 268-270, 2004
Online since
January 2004
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