Metal-Induced Crystallization of Polycrystalline Silicon by In-Situ Excimer Laser Annealing During Low-Pressure CVD Growth |
| Journal |
Materials Science Forum (Volumes 453 - 454) |
| Volume |
Progress in Advanced Materials and Processes |
| Edited by |
Dragan P. Uskokovic, Slobodan K. Milonjic, Dejan I. Rakovic |
| Pages |
43-46 |
| DOI |
10.4028/www.scientific.net/MSF.453-454.43 |
| Citation |
S. Loreti et al., 2004, Materials Science Forum, 453-454, 43 |
| Online since |
May, 2004 |
| Authors |
S. Loreti, A. Santoni, Rudolf Fryček, I. Menicucci, C. Minarini, D. Della Sala |
| Keywords |
Crystallization, Laser, LPCVD, Scanning Electron Microscope (SEM), Silicon, X-Ray Diffraction (XRD) |
| Full Paper |
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