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Advanced Materials Forum II

Materials Science Forum Volumes 455 - 456

• Papers
• Abstracts

• p1 Advances in Electrochromic Materials and Devices   [ 277 K ]
  Authors: Claes Goran Granqvist, E. Avendaño, A. Azens
• p7 Physical Properties of Sputtered ITO and WO₃ Thin Films   [ 582 K ]
  Authors: Hai Ning Cui, Vasco Teixeira, A.C. Monteiro, Elvira Fortunato, Rodrigo Martins, E. Bertran
• p12 ZnO:Ga Thin Films Produced by RF Sputtering at Room Temperature: Effect of the Power Density   [ 168 K ]
  Authors: Elvira Fortunato, V. Assunção, António Marques, Alexandra Gonçalves, Hugo Águas, Luís Pereira, Isabel Ferreira, Francisco Manuel Braz Fernandes, Rui Jorge C. Silva, Rodrigo Martins
• p16 Effect of Thermal Treatment on the Properties of Sol-Gel Derived Al-Doped ZnO Thin Films   [ 194 K ]
  Authors: Viorica Muşat, B. Teixeira, Elvira Fortunato, Regina C.C. Monteiro, Paula M. Vilarinho
• p20 KrF Laser CVD of Chromium Oxide by Photodissociation of Cr(CO)₆   [ 303 K ]
  Authors: Pedro M. Sousa, António J. Silvestre, N. Popovici, M.L. Paramês, Olinda Conde
• p25 Deposition of SiO₂ and SiO₂:Ge Films for Optical Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor   [ 194 K ]
  Authors: D. Daineka, P. Bulkin, G. Girard, J.-E. Bourée
• p30 Structural and Dielectric Characteristics of Ba₂MeWO₆ (Me=Mg, Ni, Zn) Double Perovskites   [ 499 K ]
  Authors: Dimitry D. Khalyavin, J.P. Han, Ana Maria R. Senos, Pedro Q. Mantas
• p35 Microstructure and Electrical Properties of SrBi₂Ta₂O₉ Ceramics Processed by Templated Grain Growth   [ 620 K ]
  Authors: Harvey Amorín, Maria Elisabete V. Costa, Andréi L. Kholkin
• p40 Structural and Dielectric Properties of Mg-Doped Strontium Titanate Ceramics: Dependence on the Materials Processing   [ 2 M ]
  Authors: Alexander Tkach, Paula M. Vilarinho, Andréi L. Kholkin, Ian M. Reaney, Jan Petzelt
• p45 La(Mg_1/2Ti_1/2)O₃ – Based Materials for Microwave Applications   [ 1 M ]
  Authors: M.P. Seabra, Andrei N. Salak, M. Avdeev, Victor M. Ferreira
• p50 Lead Zirconate Titanate Thin Films Prepared with Different Types of Seeds: A Comparison Study   [ 367 K ]
  Authors: Aiying Wu, Paula M. Vilarinho, I.M. Miranda Salvado
• p56 The Use of Thin Silicon Films in Flat Panel Displays   [ 1 M ]
  Authors: Didier Pribat
• p64 Improvement of Field-Effect Mobilities in TFTs: Surface Plasma Treatments Vs Stack Dielectric Structures   [ 181 K ]
  Authors: G. Lavareda, C. Nunes de Carvalho, A. Amaral, Elvira Fortunato
• p69 Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications   [ 249 K ]
  Authors: Luís Pereira, Hugo Águas, Rui Igreja, Rui Miguel S. Martins, N. Nedev, Leandro Raniero, Elvira Fortunato, Rodrigo Martins
• p73 MIS Photodiodes of Polymorphous Silicon Deposited at Higher Growth Rates by 27.12 MHz PECVD Discharge   [ 214 K ]
  Authors: Hugo Águas, Luís Pereira, Leandro Raniero, Elvira Fortunato, Rodrigo Martins