Paper Title:
Batch Processing Method to Deposit a-Si:H Films by PECVD
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 455-456)
Edited by
Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias
Pages
104-107
DOI
10.4028/www.scientific.net/MSF.455-456.104
Citation
L. Raniero, H. Águas, L. Pereira, E. Fortunato, I. Ferreira, R. Martins, "Batch Processing Method to Deposit a-Si:H Films by PECVD", Materials Science Forum, Vols. 455-456, pp. 104-107, 2004
Online since
May 2004
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Price
$32.00
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