Paper Title:
Optimisation of a Home-Made RIE System - Effect of SF6 Plasma on the Properties of Partially Etched a-Si:H Films
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Periodical
Materials Science Forum (Volumes 455-456)
Edited by
Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias
Pages
124-127
DOI
10.4028/www.scientific.net/MSF.455-456.124
Citation
P. Pereira, G. Lavareda, A.M. Botelho do Rego, A. Amaral, C. Nunes de Carvalho, "Optimisation of a Home-Made RIE System - Effect of SF6 Plasma on the Properties of Partially Etched a-Si:H Films", Materials Science Forum, Vols. 455-456, pp. 124-127, 2004
Online since
May 2004
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Price
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