Paper Title:
Deposition of SiO2 and SiO2:Ge Films for Optical Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor
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Periodical
Materials Science Forum (Volumes 455-456)
Edited by
Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias
Pages
25-29
DOI
10.4028/www.scientific.net/MSF.455-456.25
Citation
D. Daineka, P. Bulkin, G. Girard, J.-E. Bourée, "Deposition of SiO2 and SiO2:Ge Films for Optical Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor", Materials Science Forum, Vols. 455-456, pp. 25-29, 2004
Online since
May 2004
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$32.00
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