Deposition of SiO2 and SiO2:Ge Films for Optical Applications in a Matrix Distributed Electron Cyclotron Resonance Reactor |
| Journal |
Materials Science Forum (Volumes 455 - 456) |
| Volume |
Advanced Materials Forum II |
| Edited by |
Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias |
| Pages |
25-29 |
| DOI |
10.4028/www.scientific.net/MSF.455-456.25 |
| Citation |
D. Daineka et al., 2004, Materials Science Forum, 455-456, 25 |
| Online since |
May, 2004 |
| Authors |
D. Daineka, P. Bulkin, G. Girard, J.-E. Bourée |
| Keywords |
Optical Thin Films, Optical Waveguide, VHF PECVD |
| Full Paper |
Get the full paper by clicking here
|
