Paper Title:
Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 455-456)
Edited by
Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias
Pages
532-535
DOI
10.4028/www.scientific.net/MSF.455-456.532
Citation
L. Raniero, R. Martins, H. Águas, S. Zang, I. Ferreira, L. Pereira, E. Fortunato, L. Boufendi, "Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz", Materials Science Forum, Vols. 455-456, pp. 532-535, 2004
Online since
May 2004
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