Paper Title:
Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications
  Abstract

  Info
Periodical
Materials Science Forum (Volumes 455-456)
Edited by
Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias
Pages
69-72
DOI
10.4028/www.scientific.net/MSF.455-456.69
Citation
L. Pereira, H. Águas, R. Igreja, R. M. S. Martins, N. Nedev, L. Raniero, E. Fortunato, R. Martins, "Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications ", Materials Science Forum, Vols. 455-456, pp. 69-72, 2004
Online since
May 2004
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Price
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