Physical Properties of Sputtered ITO and WO3 Thin Films |
| Journal |
Materials Science Forum (Volumes 455 - 456) |
| Volume |
Advanced Materials Forum II |
| Edited by |
Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias |
| Pages |
7-11 |
| DOI |
10.4028/www.scientific.net/MSF.455-456.7 |
| Citation |
Hai Ning Cui et al., 2004, Materials Science Forum, 455-456, 7 |
| Online since |
May, 2004 |
| Authors |
Hai Ning Cui, Vasco Teixeira, A.C. Monteiro, Elvira Fortunato, Rodrigo Martins, E. Bertran |
| Keywords |
DC Sputtering, Electrical Property, Optical Property, Oxide, Thin Film, WO3 |
| Full Paper |
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