Paper Title:
Physical Properties of Sputtered ITO and WO3 Thin Films
  Abstract

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Periodical
Materials Science Forum (Volumes 455-456)
Edited by
Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias
Pages
7-11
DOI
10.4028/www.scientific.net/MSF.455-456.7
Citation
H. N. Cui, V. Teixeira, A.C. Monteiro, E. Fortunato, R. Martins, E. Bertran, "Physical Properties of Sputtered ITO and WO3 Thin Films", Materials Science Forum, Vols. 455-456, pp. 7-11, 2004
Online since
May 2004
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$32.00
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