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MIS Photodiodes of Polymorphous Silicon Deposited at Higher Growth Rates by 27.12 MHz PECVD Discharge

Journal Materials Science Forum (Volumes 455 - 456)
Volume Advanced Materials Forum II
Edited by Rodrigo Martins, Elvira Fortunator, Isabel Ferreira, Carlos Dias
Pages 73-76
DOI 10.4028/www.scientific.net/MSF.455-456.73
Citation Hugo Águas et al., 2004, Materials Science Forum, 455-456, 73
Online since May, 2004
Authors Hugo Águas, Luís Pereira, Leandro Raniero, Elvira Fortunato, Rodrigo Martins
Keywords Amorphous Silicon, MIS, PECVD 27MHz, Photodiode, Polymorphous Silicon
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