Paper Title:
Diluted Nitric Oxide (NO) Annealing of SiO2/4H-SiC in Cold-Wall Oxidation Furnace
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Periodical
Materials Science Forum (Volumes 457-460)
Edited by
Roland Madar, Jean Camassel and Elisabeth Blanquet
Pages
1345-1348
DOI
10.4028/www.scientific.net/MSF.457-460.1345
Citation
R. Kosugi, K. Fukuda, "Diluted Nitric Oxide (NO) Annealing of SiO2/4H-SiC in Cold-Wall Oxidation Furnace", Materials Science Forum, Vols. 457-460, pp. 1345-1348, 2004
Online since
June 2004
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